Description
DESCRIPTION 21553-10 21593-10 PELCO® Hydrophilic 15nm Silicon Nitride Membrane, 9 ea. 0.1×0.1mm Windows PELCO® Hydrophobic 15nm Silicon Nitride Membrane, 9 ea. 0.1 x 0.1mm Windows pkg/10 pkg/10 Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties. Depending on the process used, both Hydrophilic and Hydrophobic substrates have been created with the following advantages: Choice between low and high surface energies
Smooth and conformal substrates
Enhanced wetting and biocompatibility (hydrophilic)
No need for plasma treatment of surface prior to cell growth
Hydrophobic coating offers novel platform for deposition and growth of nanomaterials Hydrophobic surfaces improve sample preparation for materials that are dissolved or suspended in organics solvents. Nanoparticles in organic solvents (such as carbon nanotubes) will readily disperse on the Silicon Nitride membrane surface. Hydrophilic surfaces enhance wetting and dispersion of aqueous solutions. This avoids particle aggregation effects commonly observed on less hydrophilic surfaces. Particularly useful in water based sols and life science applications. Both coatings are available on 50nm and 200nm PELCO® Silicon Nitride Membranes with a 0.5 x 0.5mm window and 15nm Si3N4 membrane with 9 each 0.1 x 0.1nm windows on a 200µm silicon frame with a diameter of 3mm, compatible with all standard TEM grid holders. Both sides of the membrane and frame are coated. We advise to handle the discs by gripping at the edge. Specifications Hydrophilic: 2.5nm atomic layer-deposited hydroxylated alumina on 15, 50 and 200nm ultra-low-stress silicon nitride membrane Hydrophobic: 2.5nm atomic layer-deposited alumina and fluoro-methyl-silane on 15, 50 and 200nm ultra-low-stress silicon nitride membrane
Surface Energy: SURFACE SURFACE ENERGY (mJ/m2) STANDARD DEVIATION Silicon Nitride Membrane
46.1
4.3 Hydrophilic Coating
76.1
2.2 Hydrophobic Coating
24.6
>4.4 mj= millijoules Surface Roughness: SURFACE SURFACE ROUGHNESS (nm) STANDARD DEVIATION Silicon Nitride Membrane
Rq=0.65 Ra=0.45
0.06 0.02 Hydrophilic Coating
Rq=0.57 Ra=0.40
0.04 0.03 Hydrophobic Coating
Rq=0.66 Ra=0.40
0.03 0.05 Rq= Surface Roughness; Ra= Roughness Average Film Thickness: Resilient, low stress 15, 50 and 200nm, giving rise to minimum absorption to enable clear imaging Window Sizes: Array of 9 ea. 0.1 x 0.1mm and 0.5 x 0.5mm Frame Thickness: Silicon support structure is 200µm standard. Frame Diameter: EM standard 3mm diameter disc, fully compatible with standard TEM holders (no broken edges) EasyGrip™ Edges for easy handling with tweezers Packaging: The PELCO® Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage box. Each box holds 10 support films. MSDS 21550-10 (160KB PDF) MSDS 21552-10 (165KB PDF)
